ZnO薄膜受激发射特性的研究  被引量:8

Properties of the Stimulated Emission in the ZnO Thin Film

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作  者:梅增霞[1] 张希清[1] 王志坚[1] 王晶[1] 李庆福[1] 徐叙瑢[1] 

机构地区:[1]北方交通大学光电子技术研究所

出  处:《光谱学与光谱分析》2003年第3期461-464,共4页Spectroscopy and Spectral Analysis

基  金:高等学校骨干教师资助计划 (2 0 0 0 668)资助项目

摘  要:氧化锌薄膜因其大的激子结合能和强的光发射、激光阈值低和能在高温下工作等优点而成为制备短波长激光、发光二极管等光电子器件的有希望材料。采用激光分子束外延 (L MBE)方法制备了ZnO薄膜。在室温下 ,测量了样品的吸收光谱 ,以及不同光泵浦强度下的发射光谱。从光谱图中可以看出该材料有很好的质量。研究了ZnO薄膜的受激发射特性及机理 ;测量了发射光强与泵浦光强之间的关系 ;比较了较高激发密度下的受激发射、自发发射和激光脉冲的时间特性 ,这些都证实了该发射是受激发射。ZnO thin film is a promising material for short-wave laser and LED etc, due to its high exciton binding energy, intense stimulated emission, low lasing threshold, and high working temperature. ZnO thin films were prepared by laser molecular beam epitaxy (L-NME) in our work. At room-temperature we reported the measurements of absorption spectra and emission spectra of ZnO thin films excited by various optical pumping intensities. High structural perfection of our sample was shown in these figures. We studied the properties and mechanism of stimulated emission in ZnO thin films. The relation between emission intensity and pumping intensity was obtained. Time behaviors of the stimulated emission under relatively high pumping intensity, spontaneous emission, and laser pulses were compared, and hence the stimulated emission of ZnO thin films was proved.

关 键 词:ZNO薄膜 受激发射 氧化锌 自发发射 激光脉冲 阀值 

分 类 号:TB383[一般工业技术—材料科学与工程] O432.12[机械工程—光学工程]

 

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