AlN在AlN/VN纳米多层膜中的相转变及其对薄膜力学性能的影响  

Phase transformation of AlN in AlN/VN nanomultilayers and its effect on the mechanical properties of films

作　　者：劳技军[1] 胡晓萍[1] 虞晓江[1] 李戈扬[1] 顾明元[1] 

机构地区：[1]上海交通大学金属基复合材料国家重点实验室,上海200030

出　　处：《物理学报》2003年第9期2259-2263,共5页Acta Physica Sinica

摘　　要：采用反应磁控溅射制备了AlN VN纳米多层膜 .研究了多层膜调制周期对AlN生长结构的影响以及纳米多层膜的力学性能 .结果表明 :小周期多层膜中的AlN以亚稳的立方相 (c AlN)存在并与VN形成共格外延生长的超晶格 .薄膜产生硬度和弹性模量升高的超硬效应 .大调制周期下 ,AlN从立方结构转变为稳定的六方相 (h AlN) ,并使多层膜形成纳米晶的“砖墙”型结构 .讨论认为VN的模板作用有利于c AlN的生长 。AlN/VN nanomultilayers were prepared by reactive magnetron sputtering method. The effect of modulation period on the microstructure and mechanical properties of AlN/VN nanomultilayers were studied in this work. The results show that AlN exists in metastable cubic structure (c-AlN) at small modulation period and forms coherent epitaxial grown superlattice with VN. At larger modulation periods, AlN transforms from cubic structure to stable hexagonal structure ( h-AlN), and the nanomultilayers form a 'brick-wall' structure with nanometer grains. The discussion shows that the template effect of VN is beneficial to the growth of c-AlN, but cannot increase its critical thickness remarkably.

关 键 词：AlN/VN纳米多层膜 相转变 力学性能 外延生长 亚稳相 氮化铝 反应磁控溅射 结构 

分 类 号：O484.2[理学—固体物理]