PLASMA IMMERSION ION IMPLANTER FOR THE MODIFICATION OF INDUSTRIAL AEROSPACE COMPONENTS  

作　　者：TONGHong-hui CHENQin-chuan HUOYan-feng WANGKe FENGTan-min MULi-lan ZHAOJun PaulKChu 

机构地区：[1]DepartmentofPhysics&MaterialsScience,CityUniversityofHongKong,83TatCheeAvenue,Kowloon,HongKong [2]SouthwesternInstituteofPhysics,Chengdu610041

出　　处：《核聚变与等离子体物理》2003年第3期186-192,共7页Nuclear Fusion and Plasma Physics

基　　金：SupportedpartlybyHongKongResearchGrantsCouncilCERG(No.9040498/CityU10 32/00Eand904 0577/CityU1013/0 1E)andCityUniversityofHongKongSRG(No.7001177)

摘　　要：A commercial plasma immersion ion implanter has been designed and constructed to enhance the surface properties of parts and components used in aerospace applications. The implanter consists of a vacuum chamber, pumping and gas inlet system, custom sample chuck, four sets of hotfilaments, threefiltered vacuum arc plasma sources, special high voltage modulator, as well as monitoring and control systems. Special attention has been paid to improve the uniformity of plasma in the chamber. The power modulator operates in both the pulse bunching and single pulse modes. The maximum pulse voltage output is 80kV, maximum pulse current is 60A, and repetition frequency is 50～500Hz. The target chuck has been specially designed for uniform implantation into multiple aerospace components with irregular geometries as well as effective sample cooling. An in situ temperature monitoring device comprising dual thermocouples has been developed. The instrument was installed in an aerospace company and has been operating reliably for a year. In addition to reporting some of the hardware innovations, data on the improvement of the lifetime of an aircraft hydraulic pump disk using a dual nitrogen treatment process m-2; 30～45kV are presented. This treatment protocol has been adopted as a standard production procedure in the factory.A commercial plasma immersion ion implanter has been designed and constructed to enhance the surface properties of parts and components used in aerospace applications. The implanter consists of a vacuum chamber, pumping and gas inlet system, custom sample chuck, four sets of hotfilaments, threefiltered vacuum arc plasma sources, special high voltage modulator, as well as monitoring and control systems. Special attention has been paid to improve the uniformity of plasma in the chamber. The power modulator operates in both the pulse bunching and single pulse modes. The maximum pulse voltage output is 80kV, maximum pulse current is 60A, and repetition frequency is 50～500Hz. The target chuck has been specially designed for uniform implantation into multiple aerospace components with irregular geometries as well as effective sample cooling. An in situ temperature monitoring device comprising dual thermocouples has been developed. The instrument was installed in an aerospace company and has been operating reliably for a year. In addition to reporting some of the hardware innovations, data on the improvement of the lifetime of an aircraft hydraulic pump disk using a dual nitrogen treatment process m-2; 30～45kV are presented. This treatment protocol has been adopted as a standard production procedure in the factory.

关 键 词：等离子体沉积 离子注入 薄膜沉积 等离子体源 

分 类 号：O484.1[理学—固体物理] O539[理学—物理]