热阴极辉光放电对金刚石膜沉积的影响  

Influence of hot cathode glow discharge on the deposition of diamond films

作　　者：白亦真[1] 金曾孙[1] 姜志刚[1] 韩雪梅[1] 

机构地区：[1]吉林大学超硬材料国家重点实验室

出　　处：《材料研究学报》2003年第5期537-540,共4页Chinese Journal of Materials Research

基　　金：国家八六三计划新材料领域资助项目No.2002AA325090

摘　　要：研究了在热阴极辉光放电等离子体化学气相沉积金刚石膜过程中,热阴极辉光放电特性与金刚石膜沉积工艺的关系。结果表明,适当的阴极温度是保证大电流、高气压辉光放电的必要条件。阴极的温度影响辉光放电阴极位降区的放电性质。金刚石膜的沉积速率随着气体压力(16～20 kPa)的升高而上升,在18.6 kPa左右出现最高值,而阳极位降区电场强度的降低使膜品质下降。放电电流(8～12 A)对沉积速率的影响与气体压力的影响具有相似的规律。The relation between characteristics of hot cathode glow discharge and diamond film deposition techniques in hot cathode glow discharge plasma chemical vapor deposition process was discussed. The introduced deposition method is new and has the advantages of high growth rate and good film quality. The research results show that the cathode temperature is the key factor in determining the stability of high-current and high-pressure glow discharge. However, it has no apparent influence on the deposition rate and quality of diamond films. The gas pressure and current of the glow discharge have great influence on the deposition process. They play key roles in the deposition rate and the quality of the diamond films.

关 键 词：无机非金属材料 热阴极 等离子体化学气相沉积 辉光放电 金刚石膜 

分 类 号：O613[理学—无机化学] TB383[理学—化学]