射频等离子体法制备类金刚石薄膜  

Preparation of Diamond-like Carbon Films with RF Plasma Method

作　　者：张万虎[1] 谭宇[1] 师建涛[1] 刘永强[1] 胡仓陆[1] 

机构地区：[1]西安应用光学研究所,陕西西安710065

出　　处：《应用光学》2003年第6期32-34,共3页Journal of Applied Optics

摘　　要：　利用射频等离子体化学气相沉积法,以丁烷、氢气和氩气的混合气体为原料,在Φ200mm锗基片上沉积出均匀的类金刚石薄膜。研究类金刚石薄膜的特性及工艺参数对其性能的影响规律,给出应用于红外装置中的类金刚石薄膜镀膜元件光谱性能。The homogeneous diamondlike carbon films are deposited on Φ200 mm substrate by means of RF plasma chemical vapordeposition mothod with the mixture of butane,hydrogen and argon gas. The law of the property of the diamondlike carbon films and technic parameters which affect its performance are studied.The spectrum properties of coated elements used in infrared devices are given.

关 键 词：类金刚石薄膜 射频等离子体 功率密度 

分 类 号：TB43[一般工业技术]