IBED Si_3N_4和TiN薄膜的成份、结构与摩擦学性能  

Composition and Structure and Tribological Properties of IBED Si_3N_4 and TiN Thin Films

作　　者：庄大明[1] 刘家浚[1] 朱宝亮[1] 李文治[1] 张绪寿[2] 杨生荣[2] 

机构地区：[1]清华大学摩擦学研究所 [2]中科院兰州化物所固体润滑实验室

出　　处：《表面工程》1996年第3期2-7,共6页

摘　　要：本文考察了工艺参数对离子束增强沉积（IBED）氮化硅、氮化钛薄膜的成分和微观组织的影响。测定了薄膜的硬度以及薄膜与基体之间结合力，分析了成分和结构与薄膜的硬度和结合力的关系。考察了在不同载荷和速度条件下St_3N_4、TiN薄膜和52100钢试样的摩擦系数和耐磨性。结果显示，与无膜的52100相比，IBEDSt_3N_4和IBEDTiN的耐磨性成倍提高。探讨了薄膜的磨损机理。This paper investigates the innuences of the technical parameters on the composition andmicro structure of Si3N4 and TiN thin films produced by ion beam enhanced deposition. Film hardness andbinding forces with the substrate is measured. Analyses are conducted concerning the relations between thecomposition and structure with film hardness and binding forces with the substrate. The coefficient offriction and the wear resistance of Si3N4 and TiN thin films and the 52100 specimen are inspected underdifferent velocity and loading conditions. Results show that the wear resistance has increased doubled andredoubled compared with the 52100 specimen without films. Abrasion mechanisms are being explored.

关 键 词：离子束增强沉积 IBED 氮化硅 氮化钛 陶瓷薄膜 摩擦学性能 结构 

分 类 号：TG174.453[金属学及工艺—金属表面处理]