基片下磁场磁控对溅射辉光及薄膜梯度的影响  

The influence of the magnetic field magnetron under the substrate on the sputtering glow and film thickness gradient

作　　者：赵新民[1] 狄国庆[1] 

机构地区：[1]苏州大学物理系,苏州215006

出　　处：《物理学报》2004年第1期306-310,共5页Acta Physica Sinica

摘　　要：溅射时在基片下方放置磁铁 ,让来自基片下方的磁场发挥磁控作用 ,以此来研究基片下磁场磁控溅射的方法 .发现辉光形貌以及沉积的薄膜厚度分布均发生明显变化的同时 ,辉光的外形也随着外加磁铁直径的变化而变化 .运用磁荷理论对空间磁场分布进行模拟 ,解释了辉光形貌变化的机理 ;运用沉积粒子在外加梯度磁场中运动理论解释了膜厚分布 .A new magnetron sputtering method is tried by placing a magnet under the substrate during sputtering. Compared with the case without applied magnetic filed, we have found that the glow appearances and the film thickness distribution are changed greatly. The aspect of the glow above the substrate face vary with the magnet diameter. We make the glow appearances mechanism clear using the simulation of the magnetic field, and interpret the film thickness distribution as a result of the motion of the particles sputtered from the target in the special-distributed magnetic field.

关 键 词：磁控溅射 溅射辉光 薄膜梯度 薄膜生长 磁矩 磁场强度 

分 类 号：O484.4[理学—固体物理]