利用(110)硅片制作体硅微光开关的工艺研究  

Fabrication Technique of Bulk-Silicon Micro-Optical Switch in (110) Silicon

作　　者：张龙[1] 董玮[1] 张歆东[1] 刘彩霞[1] 陈维友[1] 徐宝琨[1] Zhang Long;Dong Wei;Zhang Xindong;Liu Caixia;Chen Weiyou;Xu Baokun(Jilin University Region,State Key Laboratory on Integrated Opto-Electronics,Changchun 130023,China)

机构地区：[1]集成光电子学国家重点联合实验室吉林大学实验区,长春130023

出　　处：《Journal of Semiconductors》2004年第1期99-103,共5页半导体学报(英文版)

基　　金：国家高技术研究发展计划(批准号:2002 AA312023);国家自然科学基金(批准号:69937010);吉林省科学计划(批准号:20010319);跨世纪优秀人才培养计划基金资助项目

摘　　要：采用基于湿法腐蚀工艺的体硅微机械加工方法,利用(110)硅片结晶学特性,通过光刻、反应离子刻蚀和湿法刻蚀等工艺,在硅片上同时制作出微光开关的微反射镜结构、悬臂梁结构、扭臂梁结构和光纤定位槽结构,器件的一致性好,制作工艺简单.利用扇形定位区域,精确地沿(110)硅片的{111}面进行定向腐蚀,可使微反射镜镜面垂直度达到90±0.3°,经测量表面粗糙度低于6 nm.Using bulk-silicon micro-mechanical technique by crystal characters of(110)silicon,in which photolithography,reaction ion etching,and wet-etching technique are included,micro-mirror,cantilever beam,torsion beam,and fiber orientation slots are fabricated simultaneously on(110)silicon.Therefore,the consistency of the device is very good and the fabrication technique is very easy.By advanced etching sector orientation structure,it can be accurately etched along the{111}sides of silicon in KOH solution.So the perfect mirror is got,and its surface roughness is less than 6nm,and its perpendicularity is 90±0.3°.

关 键 词：微反射镜 {111}面 湿法腐蚀 粗糙度 氢氧化钾溶液 

分 类 号：TN25[电子电信—物理电子学] TN929.11