双离子束溅射技术制备带通滤光片  

Preparation narrow-band pass filter by dual-ion beams sputtering deposition

作　　者：申林[1] 熊胜明[1] 刘洪祥[1] 李凌辉[1] 张云洞[1] 

机构地区：[1]中国科学院光电技术研究所,四川成都610209

出　　处：《光学仪器》2004年第2期87-90,共4页Optical Instruments

摘　　要：研究了采用双离子束溅射沉积技术、以沉积时间作为膜厚控制手段制备带通滤光片的工艺。简要介绍了离子束溅射系统的基本工作原理和膜厚控制技术,描述了分别在K9玻璃和有色玻璃上制备由多层Ta2O5和SiO2薄膜组成的滤光片以及短波通和长波通的工艺过程,最后测试并分析了由短波通和长波通组成带通滤光片的光学性能。实验结果表明,采用双离子束溅射技术,以沉积时间作为膜厚监控手段能够制备出具有优良光性能并满足应用设计要求的带通滤光片。The narrow-band pass filter constituent with Ta_2O_5 and SiO_2 multilayers were prepared by dual ion-beams sputtering technology and the thickness of films was controlled with deposited time. The basic principle of dual ion-beams sputtering technology, the band pass filter design and the deposited techniques was present. The long wave pass (LWP) filter on K9 glass and the short wave pass (SWP) filter on colored glass were deposited, respectively. The optical performance of the narrow-band pass filter constituent with LWP and SWP was characterized by spectrophotometer. It is obvious that ion-beams sputtering technology can be used to prepare narrow-band pass filter.

关 键 词：双离子束溅射 制备 带通滤光片 沉积时间 膜厚控制 

分 类 号：TB851.7[一般工业技术—摄影技术]