国家自然科学基金(0804201051)

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相关期刊:《Chinese Physics Letters》更多>>
相关主题:LOW-VOLTAGEINDIUM-TIN-OXIDEDIELECTRICBA0GATED更多>>
相关领域:电子电信更多>>
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Low-Voltage Depletion-Mode Indium-Tin-Oxide Thin-Film Transistors Gated by Ba0.4Sr0.6TiO3 Dielectric
《Chinese Physics Letters》2010年第7期285-287,共3页王丽萍 陆爱霞 窦威 万青 
Supported by the National Natural Science Foundation of China under Grant No 10874042, the Foundation for Authors of National Excellent Doctoral Dissertation of China under Grant No 200752, and the Natural Science Foundation of Zhejiang Province (No 0804201051).
We report on the fabrication and characterization of low-voltage indium-tin-oxide (ITO) thin-film transistors (TFTs) gated by a0.4Sr0.6TiO3 (BST) gate dielectric deposited at room temperature. The 400-nm-thick B...
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