Supported by the National Natural Science Foundation of China under Grant No 10874042, the Foundation for Authors of National Excellent Doctoral Dissertation of China under Grant No 200752, and the Natural Science Foundation of Zhejiang Province (No 0804201051).
We report on the fabrication and characterization of low-voltage indium-tin-oxide (ITO) thin-film transistors (TFTs) gated by a0.4Sr0.6TiO3 (BST) gate dielectric deposited at room temperature. The 400-nm-thick B...