Project supported by the National Natural Science Foundation of China (Grant Nos. 10975094 and 10735070);the National Basic Research Program of China (Grant No. 2010CB832906);Program for New Century Excellent Talents in University,Ministry of Education of China (Grant No. NCET-07-0516);the Foundation for the Author of National Excellent Doctoral Dissertation of China (Grant No. 10422-2007B1)
The erbium ions at energy of 400 keV and dose of 5× 10^15 ions/cm^2 were implanted into silicon single crystals at room temperature at the angles of 0°,45° and 60°. The lateral spread of 400 keV erbium ions implan...