LOW-DIELECTRIC-CONSTANT

作品数：4被引量：1H指数：1
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相关期刊：《Plasma Science and Technology》《Chinese Physics Letters》《Chinese Journal of Chemistry》《Chinese Chemical Letters》更多>>
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Recent Advance in Low-Dielectric-Constant Organosilicon Polymers
《Chinese Journal of Chemistry》2023年第18期2371-2381,共11页Jiaren Hou Jing Sun Qiang Fang 
supported by the National Natural Science Foundation of China(NSFC,Nos.22175195,22075311 and 21975278).
Comprehensive Summary,Low dielectric(low-k)organosilicon polymers have received extensive interests from industry and academia due to good electrical insulation,high temperature resistance,flame retardancy and hydroph...
关键词：Organosilicon polymers Low dielectric materials Thermosetting resins Functional polymers MONOMERS RESINS 
Structure and properties of low-dielectric-constant poly(acetoxystyrene-co-octavinyl-polyhedral oligomeric silsesquioxane) hybrid nanocomposite被引量：1
《Chinese Chemical Letters》2010年第4期488-491,共4页Zhang, Chao Xu, Hong Yao Zhao, Xian 
financially supported by the National Natural Science Foundation of China(Nos.90606011, 50472038 and 2097401);PhD Program Foundation of Ministry of Education of China(No.20070255012);Shanghai Leading Academic Discipline Project(No.B603);Open Project of The State Key Laboratory of Crystal Materials(KF0809);the Program of Introducing Talents of Discipline to Universities(No.111-2-04);Doctoral Dissertation Innovation Project(No.BC200907)
Low-dielectric-constant poly(acetoxystyrenezhi-co-octavinyl-polyhedral oligomeric silsesquioxane)(PAS-POSS) organicinorganic hybrid nanocomposite was successfully synthesized via one-step free radical polymerization a...
关键词：LOW-DIELECTRIC-CONSTANT Hybrid nanocomposite POSS 
Electrical Properties of Plasma Deposited Low-Dielectric-Constant Fluorinated Amorphous Carbon Films
《Plasma Science and Technology》2006年第6期724-726,共3页吴振宇 杨银堂 汪家友 
supported by the Key Laboratory Foundation of Electron Devices Reliability Physics and Applications(No.51433020205DZ01);the Xi'an Applied Materials Innovation Fund(No.XA-AM-200501)
Fluorinated amorphous carbon （a-C：F） films were deposited at room temperature using C4Fs and CH4 as precursor gases by electron cyclotron resonance chemical vapour deposition （ECR-CVD）. Chemical structures were a...
关键词：electrical properties conduction behaviour chemical vapour deposition a-C：F 
Probing Cu Diffusion Barrier Layers on Porous Low-Dielectric-Constant Films by Posireonium Annihilation Lifetime Spectroscopy
《Chinese Physics Letters》2005年第11期2906-2909,共4页胡一帆 SUN Jia-Ning Gidley D.W. 
Supported partially by the National Natural Science Foundation of China under Grant No 60476011.
Two kinds of Cu diffusion barrier layers, sealed films and capped films, on nanoporous low-dielectric-constant films are investigated by positronium annihilation lifetime spectroscopy （PALS）. We have found that the ...
关键词：THIN-FILMS 
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