云南高校图书馆联盟文献共享服务平台- SCATTEROMETRY

SCATTEROMETRY: 作品数：5被引量：13H指数：2; 导出分析报告; 相关领域：电子电信更多>>; 相关期刊：《Light(Advanced Manufacturing)》《Nanomanufacturing and Metrology》《Journal of Semiconductors》《Light(Science & Applications)》更多>>

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Model-based characterisation of complex periodic nanostructures by white-light Mueller-matrix Fourier scatterometry被引量：1: 《Light(Advanced Manufacturing)》2021年第3期31-44,共14页Maria Laura Gödecke Karsten Frenner Wolfgang Osten; supported by the Deutsche Forschungsgemeinschaft(DFG,German Research Foundation)under grant number Os 111/50-1.; Optical scatterometry is one of the most important metrology techniques for process monitoring in high-volume semiconductor manufacturing.By comparing measured signatures to modelled ones,scatterometry indirectly retr...; 关键词：SCATTER hence inverse