Supported by the National Basic Research Program of China under Grant Nos 2013CB632103 and 2011CBA00608;the National Natural Science Foundation of China under Grant Nos 61036003,61177038 and 61176013;the Science Research Foundation of Huaqiao University under Grant 12BS221.
Germanium-tin(Ge_(1-x)Sn_(x))p-type metal-oxide-semiconductor field effect transistors(pMOSFETs)were fabricated using a strained Ge_(0.985)Sn_(0.015) thin film that was epitaxially grown on a silicon-on-insulator subs...