National Key Research and Development Program of China under Grant 2018YFB1107700, 2018YFB1107400, and 2016YFB1102503;National Key Basic Research Program of China under Grant 2015CB059900;National Natural Science Foundation of China under Grant 51705013;Beijing Natural Science Foundation under Grant J170002
As a simple, reproducible, and pollution-free technique with the potential of integration and automation, laser processing has attracted increasing attention. Laser processing, which includes laser polishing, laser cl...
supported by National Natural Science Foundation of China(Grant No.51005184);National Science and Technology Major Project of Ministry of Science and Technology of China(Grant No.2009ZX04014-053)
The existing methods for blade polishing mainly focus on robot polishing and manual grinding.Due to the difficulty in high-precision control of the polishing force,the blade surface precision is very low in robot poli...
supported by the Key Program of the National Natural Science Foundation of China(Nos.61176050,61036003,61176092, 60837001;the Fundamental Research Funds for Fujian Province of China(No.2012H0038);the National Basic Research Program of China (Nos.2012CB933503,2013CB632103);the Fundamental Research Funds for the Central Universities,China(No.2010121056)
We prepared germanium-on-insulator(GOI) substrates by using Smart-CutTM and wafer bonding technology. The fabricated GOI is appropriate for polishing due to a strong bonding strength(2.4 MPa) and a sufficient bond...
supported by the Center for Advanced Materials Processing (CAMP) at Clarkson University;the National Integrate Circuit Research Program of China (Grant No. 2009ZX02023-3);the National Basic Research Program of China (GrantNos. 2007CB935400,2010CB934300 and 2006CB302700);the National High Technology Development Program of China (GrantNo. 2008AA031402);the Science and Technology Council of Shanghai,China (Grant Nos. 08DZ2200700,08JC1421700 and09QH1402600);the Chinese Academy of Sciences Visiting Professorship for Senior International Scientists
We report on the investigation of the origin of high oxide to nitride polishing selectivity of ceria-based slurry in the presence of picolinic acid. The oxide to nitride removal selectivity of the ceria slurry with pi...