supported by the National Basic Research Program of China (No. 2007CB607602);the Science Found for Distinguished Yong Scholars of Heilongjiang Province,China (No. JC200901);the National Natural Science Foundation of China (No. 50875058);the Program of Excellent Teams of Harbin Institute of Technology
Tantalum nitride and tantalum carbide films were fabricated using magnetron sputtering of tantalum followed by nitrogen and carbon plasma-based ion implantation (N-PBII and C-PBII). The phase evolution and morpholog...