Diamond-like carbon (DLC) is a metastable amorphous material that exhibits unique properties. However, there are many limitations regarding the use of this material due to factors such as its tribological characterist...
In this article, the authors report on the use of Radio Frequency (RF) Magnetron Sputtering combined with Plasma-Based Ion Implantation (PBII) technique to synthesize the Boron-Carbon (B-C) films. High purity of boron...
supported by NSFC(51001039);National Basic Research Program of China(No.2007CB607602);The Program of Excellent Teams of Harbin Institute of Technology;Science Found for Distinguished Yong Schoolars of Heilongjiang Province(JC200901)
The composition and structure of PIII(plasma immersion ion implantation)carbonitrided Cr4Mo4V steel were analyzed using X-ray photoelectron spectroscopy(XPS),X-ray diffraction(XRD),optical microscopy(OM)and SEM.The re...
Supported by the Science and Technology Projects of Chongqing Municipal Education Commission(KJ060805,KJ100602);Chongqing Normal University Scientific Research Foundation Project(10XLZ005,2011XLS30)
Poly[(μ4-2,6-dimethylpyridine-3,5-dicarboxylato)dihydrate]diaqualead(II)] (1) exhi- bits a two-dimensional (2-D) layer structure in which the asymmetric unit contains one Pbn centre, one 2,6-dimethylpyridine-...
supported by the National Basic Research Program of China (No. 2007CB607602);the Science Found for Distinguished Yong Scholars of Heilongjiang Province,China (No. JC200901);the National Natural Science Foundation of China (No. 50875058);the Program of Excellent Teams of Harbin Institute of Technology
Tantalum nitride and tantalum carbide films were fabricated using magnetron sputtering of tantalum followed by nitrogen and carbon plasma-based ion implantation (N-PBII and C-PBII). The phase evolution and morpholog...
The implantation of Cu into Si substrate was carried out by plasma based ion implantation (PBII) using unbalanced magnetron sputtering (UBMS) cathode as the metal plasma source. The different pulse bias ( U p) and the...