Supported by the National High Technology Research and Development Program of China under Grant No 2006AA03Z307, the National Natural Science Foundation of China under Grant Nos 60628403 and 60776017, and SRFDP (20060246032).
The reaction mechanisms of Al(CH3 )3 (TMA) adsorption on H-passivated GeSi(100)-2 × 1 surface are investigated with density functional theory. The Si-Ge and Ge-Ge one-dimer cluster models are employed to repres...
Supported by the National Natural Science Foundation of China under Grant Nos 60425411 and 10874030, the National Basic Research Programme of China under Grant No 2006CB921505, and Shanghai Science and Technology Commission.
Electrical properties of individual self-assembled GeSi quantum dots grown on Si substrates are investigated by using conductive atomic force microscopy at room temperature. By controlling the bias voltage sweep in a ...
Relaxed Ge_(0.5)Si_(0.5)/Si heterostructure was grown by the rapid radiant heating,very low pressure chemical vapor deposition(RRH-VLP/CVD).We report the anomalous temperature dependence of photoluminescence(PL)from p...