光刻机的匹配和调整  

Match and Alignment Accuracy of Step and Repeat System

作　　者：周虎明[1] 韩隽[1] 

机构地区：[1]中国电子科技集团公司第58研究所,江苏无锡214035

出　　处：《电子与封装》2003年第3期40-44,共5页Electronics & Packaging

摘　　要：光刻机的匹配使用是半导体工艺大生产线上提高生产效率的一项重要措施。光刻机的匹配主 要包括场镜误差的匹配和隔栅误差的匹配,如何调整相同型号光刻机的匹配使用将是本文论述的重点。On a mass production line,multiple Step-and-Repeat system are generally used in a manufacturing system. The specification for each machine maybe slightly diffetent. It will be discussed how to adjust the accuracy of each and match the Intrafield Error and grid Error of each machine.The Article will be concerned to discuss the matching for same type Step-and-Repeat system.

关 键 词：套刻精度 误差 匹配 调整 

分 类 号：TN305[电子电信—物理电子学]