沉积温度对反应电子束蒸发TiO_2薄膜结构和光学性能的影响  

Effect of deposition temperature on structure and optical property of TiO_2 film prepared by reactive electron beam evaporation

作　　者：杨陈[1] 樊慧庆[1] 惠迎雪[1] 

机构地区：[1]西北工业大学材料学院,西安710072

出　　处：《红外与激光工程》2006年第z2期175-178,共4页Infrared and Laser Engineering

基　　金：教育部博士点基金(20050699011);新世纪人才计划项目(NCET-05-0871)

摘　　要：TiO_2具有较高的折射率,在光学方面有着广泛的应用。文中采用等离子辅助反应电子束真空蒸镀法,以 Ti 为膜料、纯度为99.99%的 O_2为反应气体,在玻璃衬底上制备了 TiO_2薄膜。使用 XRD、OM、SEM 分别对50℃、150℃、300℃三个不同沉积温度下制备的薄膜及其经过450℃真空退火1h 后的结构进行了分析,并对薄膜的折射率进行测量。实验结果表明,提高沉积温度可以增加成膜原子的能量及其在衬底上的扩散能力,使沉积的薄膜结构平整致密,具有较高的折射率。TiO_2 has high refractive index and plays an important role in the fields of optics.In this article,TiO_2 films are prepared on glass substrate by ion beam assistant reactive electron beam evaporation.Ti is used as the evaporated material and high purity O_2(99.99%)is used as the thermal oxidative gas.TiO_2 films have been deposited at 50℃,150℃ and 300℃ respectively.Then as-deposited TiO_2 films are annealed in vacuum at 450℃ for 1h. Structures and optical properties of TiO_2 films are studied with XRD,SEM,OM and Ellipsometry.As a result,a TiO_2 film can be prepared with compact structure and high refractive index when a high deposition temperature is used.

关 键 词：TIO2薄膜 电子束蒸发 沉积温度 薄膜结构 光学性质 

分 类 号：O439[机械工程—光学工程]