深亚微米工艺用二次纯水系统  

A 2nd Pure Water System for Deep Submicron Processes

作　　者：王铁坤[1] 华卫群[1] 孙勇山[1] 

机构地区：[1]无锡微电子科研中心,江苏无锡214035

出　　处：《电子与封装》2002年第2期38-44,共7页Electronics & Packaging

摘　　要：本文介绍了深亚微米工艺用二次超纯水系统主要工艺流程及其各部分的作用。比较了一次纯水电阻率,二次纯水电阻率及二次纯水 TOC 含量的相互关系。讨论了半导体集成电路制造工艺对超纯水的水质要求以及水中杂质对半导体工艺的影响。The main process flow of a 2nd pure water system for deep submicron processes and the functions of the various parts of the system are desribed.Comparisons are made between the resistivity of 1st pure water, resistivity of 2nd Pure water and TOC content of 2nd pure water,Requirements of semiconductor IC fabrication processes for the quality of ultropure water on semiconductor processes are discussed.

关 键 词：深亚微米 一次纯水 二次纯水 

分 类 号：TN305.97[电子电信—物理电子学]