Si过渡层对氟化类金刚石薄膜附着特性的影响  

Adhesion of fluorinated diamond-like carbon films with a silicon interlayer

作　　者：杨亦赏[1] 江舸[2] 周杨[1] 江美福[1] 

机构地区：[1]苏州大学物理科学与技术学院,江苏苏州215006 [2]四川大学物理科学与技术学院,四川成都610065

出　　处：《苏州大学学报（自然科学版）》2012年第4期51-57,共7页Journal of Soochow University(Natural Science Edition)

基　　金：国家自然科学基金(11275136;1075114)

摘　　要：研究了不锈钢基片上Si过渡层对F-DLC薄膜附着特性的影响.采用反应磁控溅射法,以Ar为源气体,在316L不锈钢基片制备了Si薄层,并在Si薄层上沉积了F-DLC薄膜,通过划痕实验测试了各个样品的膜/基结合强度.结果表明,引入Si过渡层可以明显增强氟化类金刚石薄膜和不锈钢基片之间的结合强度,在200 W下制备的Si过渡层上,F-DLC薄膜的结合强度最佳.根据薄膜表面形貌的扫描电镜观察、晶粒尺寸的分析以及薄膜键结构的红外光谱、拉曼光谱分析,F-DLC薄膜的结合强度与Si—C键等基团的形成、含量以及Si的键入方式有关.In this paper,the adhesion of fluorinated diamond-like carbon films with a silicon interlayer was studied.The silicon interlayer films were grown on 316L stainless steel in different input powers by radio frequency reactive magnetron sputtering with argon(Ar) as source gas,and the fluorinated diamond-like carbon films(F-DLC) were prepared on the silicon interlayer.The adhesion of the F-DLC films was measured by use of the micro-scratch test.The result showed that the addition of a silicon interlayer significantly increased the adhesion of the F-DLC films,and a correlation was found between the adhesion and the parameter of input powers for growing the silicon interlayer.The crystal size of the F-DLC films was evaluated according to the SEM photos along with the Landford's function.By employing FTIR and Raman scattering spectroscopy,the study also analyzed the quality of the films.The experiment results also showed that the Si—C bond have remarkably contributed to the improvement of the adhesion of the F-DLC films on stainless steel.

关 键 词：磁控溅射 Si过渡层 氟化类金刚石薄膜 结合强度 

分 类 号：O484[理学—固体物理]