(ZrTANbTiW)N薄膜组织结构与机械性能研究(英文)  

Structural and Mechanical Properties of(ZrTaNbTiW)N Films

作　　者：冯兴国[1] 唐光泽[2] 马欣新[1,3] 孙明仁[3] 

机构地区：[1]哈尔滨工业大学先进焊接与连接国家重点实验室,黑龙江哈尔滨150001 [2]哈尔滨工业大学空间材料及环境工程国家级重点实验室,黑龙江哈尔滨150001 [3]哈尔滨工业大学金属精密热加工国家级重点实验室,黑龙江哈尔滨150001

出　　处：《稀有金属材料与工程》2013年第S2期41-45,共5页Rare Metal Materials and Engineering

基　　金：Combination Project of Guangdong Province and the Ministry of Education(2010B090400444);Special Funds for International Cooperation Projects in Guangdong Province(2010B050900003);Science and Technology Projects of Guangdong Province(2010A070500002)

摘　　要：采用多靶磁控溅射与氮等离子体基离子注入技术制备了多元(ZrTANbTiW)N薄膜,对薄膜的组织结构及硬度进行了研究。结果表明:薄膜的化学成分主要受到样品距靶距离的影响;ZrTANbTiW合金薄膜为非晶或体心立方结构,而其(ZrTANbTiW)N氮化物薄膜由体心立方与面心立方固溶体结构组成;氮离子注入后样品的硬度与弹性模量都有较大程度的提高且最大硬度与弹性模量达到了9.8和149.1GPa。(ZrTaNbTiW)N films were prepared by multi-target magnetron sputtering deposition and nitrogen plasma based ion implantation.The composition,structure and mechanical properties of the films were investigated.The composition of the films is mainly dependent on the distance between the sample and targets.X-ray diffraction(XRD) shows the ZrTaNbTiW alloy films exhibit amorphous or single BCC structure,while the(ZrTaNbTiW)N nitride films are composed of BCC and FCC structures.The hardness and modulus of the films are increased after nitrogen implantation and reach a maximum value of 9.8 and 149.1 GPa,respectively.

关 键 词：多元薄膜 磁控溅射 离子注入 结构 硬度 

分 类 号：TB383.2[一般工业技术—材料科学与工程]