射频磁控溅射制备纳米TiO_2薄膜及其光致特性研究  

Studies of Photo-induced Characteristics of Nanoscale Titanium Dioxide Thin Films Grown by RF Magnetron Sputtering

作　　者：沈杰[1] 沃松涛[1] 崔晓莉[1] 杨锡良[1] 章壮健[1] 

机构地区：[1]复旦大学材料科学系,上海200433

出　　处：《真空科学与技术学报》2004年第2期81-86,共6页Chinese Journal of Vacuum Science and Technology

摘　　要：在室温下采用射频溅射法制备纳米TiO2 薄膜 ,并用XRD、AFM、Raman谱仪等手段研究了不同溅射气压及不同退火温度处理后薄膜的结构及其相应的亲水性、光催化能力。结果表明 :在室温下制备的薄膜为无定形结构 ,当退火温度超过4 0 0℃时转化为锐钛矿结构。在 4 0 0℃下退火Nanoscale titanium dioxide thin films were grown by RF magnetron sputtering at room temperature Microstructures of the thin films grown at different sputtering pressures and annealing temperatures were measured by XRD,AFM and Raman spectroscopy,and their photo induced hydrophilicity and photocatalytic activity have also been studied The results show that the as deposited TiO 2 thin films are amorphous and the anatase phase forms when anneal temperature is over 400 ℃ The TiO 2 thin films annealed at 400 ℃ for an hour exhibit a good hydrophilicity and photocatalytic activity.

关 键 词：射频溅射 磁控溅射 纳米TIO2薄膜 纳米二氧化钛薄膜 光致特性 溅射气压 退火温度 

分 类 号：TB383[一般工业技术—材料科学与工程]