氧扩散热处理SrTiO_3压敏电阻的非线性和界面势垒  

Nonlinearity and Interface Barrier of SrTiO_3 Varistor Based on Oxygen-diffusion Heat Treatment

作　　者：陈志雄[1] 庄严 周方桥[1] 李红耘 熊西周 梁鸿东[1] 

机构地区：[1]广州大学理学院固体物理与材料研究实验室,广东广州510405 [2]广州新日电子有限公司,广东广州510335

出　　处：《电子元件与材料》2004年第9期11-13,16,共4页Electronic Components And Materials

基　　金：广州市科技计划资助项目(2002JI-C0191)

摘　　要：伏安特性测量和分析表明,随热处理温度增高,空气中氧扩散热处理SrTiO3压敏电阻的界面电子势垒高度和压敏电压不断增大,而非线性系数则开始增大随后反而减小。分析认为,这与扩散层的厚度不断增加有关。复阻抗测量得到晶粒电阻Rg随热处理温度增高而增大的实验事实,为扩散层的存在及其变化提供了间接证明。Measured and analyzed were the volt-ampere characteristics of SrTiO3 varistor based on oxygen-diffusion heat treatment. Obtained results show that both height of interface barrier and varistor voltage will increase continuously, but nonlinear coefficient increase firstly and then decrease with the increase of heat treatment temperature. The thickness of diffusion-layer will increase continuously while the increase of heat treatment temperature. The presence and change of the diffussion-layer are supported by the experimental fact of a complex impedance plots,i.e. the resistance of grain increase with the increase of heat treatment temperature.

关 键 词：SRTIO3压敏电阻 非线性 界面势垒 氧扩散热处理 

分 类 号：TM54[电气工程—电器]