下一代光刻技术的设备  

Next Generation Lithography and Equipment

作　　者：翁寿松[1] 

机构地区：[1]无锡市罗特电子有限公司,江苏无锡214002

出　　处：《电子工业专用设备》2004年第10期35-38,共4页Equipment for Electronic Products Manufacturing

摘　　要：下一代光刻技术是指≤32nm工艺节点的光刻技术。介绍了下一代光刻技术与设备,包括X射线光刻技术、极紫外线光刻技术和纳米压印光刻技术等。The next generation lithography is the lithography technology of the ≤32 nm technology node. In this paper, the next generation lithography and equipment are introduced, consist of the x-ray lithography, the extreme ultraviolet lithography, the nanoimprint lithography and so on.

关 键 词：下一代光刻技术 X射线光刻技术 极紫外线光刻技术 纳米压印光刻技术 

分 类 号：TN305.7[电子电信—物理电子学]