反应溅射Ti-Si-N纳米晶复合薄膜的微结构与力学性能  

Microstructure and Properties of Ti-Si-N Nanocomposite Films Deposited by Reactive Sputtering

作　　者：梅芳华[1] 邵楠[1] 胡晓萍[1] 李戈扬[1] 顾明元[1] 

机构地区：[1]上海交通大学金属基复合材料国家重点实验室,上海200030

出　　处：《真空科学与技术学报》2004年第4期267-270,共4页Chinese Journal of Vacuum Science and Technology

基　　金：上海市纳米科技专项基金项目 ( 0 3 5 2nm0 84)

摘　　要：采用Ar、N2 和SiH4混合气体反应溅射制备了一系列不同Si含量的Ti Si N复合膜 ,用EDS、XRD、TEM和微力学探针研究了复合膜的微结构和力学性能。结果表明 ,通过控制混合气体中SiH4分压可以方便地获得不同Si含量的Ti Si N复合膜。当Si含量为 (4～ 9)at%时 ,复合膜得到强化 ,最高硬度和弹性模量分别为 34 2GPa和 398GPa。进一步增加Si含量 ,复合膜的力学性能逐步降低。微结构研究发现 ,高硬度的Ti Si N复合膜呈现Si3 N4界面相分隔TiN纳米晶的微结构特征 ,其中TiN纳米晶的直径约为 2 0nm ,Si3 N4界面相的厚度小于 1nm。Ti-Si-N nanocomposite films with varying Si content were grown by reactive sputtering in a mixture of Ar,N 2 and SiH 4 at low pressure.The microstructures and properties of the film were studied with energy dispersion spectroscopy (EDS),X-ray diffraction (XRD),transmission electron microscopy (TEM) and nanoindentor.It is found that the Si content can be well controlled by adjusting SiH 4 partial pressure.The film hardness increases with Si content ranging from 4 at% to 9 at%,but gradually decreases as Si content goes higher than 9 at %.The maximum hardness and elastic modulus are estimated to be 34.2 GPa and 398 GPa,respectively.The microstructures of the high hardness samples were found to consist of TiN nanocrystal grains,20 nm in diameter,surrounded by Si 3N 4 interphase of a thickness of 1.0 nm.

关 键 词：SI3N4 力学性能 反应溅射 纳米晶 高硬度 力学探针 微结构 界面相 复合膜 复合薄膜 

分 类 号：TB383[一般工业技术—材料科学与工程] TB332