高能电子束曝光技术研究  

Research of High Energy Electron Beam Lithography

作　　者：田丰[1] 靳鹏云[1] 彭开武[1] 韩立[1] 顾文琪[1] 

机构地区：[1]中国科学院电工研究所微纳加工实验室,北京100080

出　　处：《微细加工技术》2004年第4期7-10,共4页Microfabrication Technology

摘　　要：介绍了将商用透射电镜JEM-2000EX改造为高能电子束曝光系统的研制工作,在现阶段研制工作的基础上进行了曝光实验。结果表明,利用此高能电子束曝光系统可以制备出纳米线条,并且能够制备出具有高深宽比的微细结构,从而为微小器件的加工提供了新的方法。The research work about modifying a commercial transmission electron microscope (JEM-2000EX) into a lithography system is introduced, and the experiments are carried out on this system. The exposure results show that this modified high energy electron beam lithography system has the ability to exposure the nano lines and fabricate micro structures with high aspect ratio,therefore providing a new technology for micro device fabrication.

关 键 词：电子束曝光 高能 透射电镜 改造 纳米加工 

分 类 号：TN305[电子电信—物理电子学]