纳米厚度非透明介质薄膜的测量  

Measuring and Calculating the Thickness of Non-transparent Dielectric Thin Film

作　　者：缪建伟[1] 崔明启[1] 唐鄂生[1] 修立松[1] 

机构地区：[1]中国科学院高能物理研究所

出　　处：《光学精密工程》1994年第1期21-25,共5页Optics and Precision Engineering

摘　　要：本文叙述了用椭偏仪多次入射选择最佳法测量纳米厚度非透明薄膜原理及方法，给出了由此方法测量得到的数据和用迭代法（下降法）计算得到的膜厚结果，并与台阶仪测试结果进行了比较。In this paper,we use a new method of measuring and calculating the thickness of non-transparent film with Ellipsometer.It improves the multi-incident angle method putforward by R. M.A.Azzam. With this method two samples have been investigated(film Si on sub-stract BK7).And the results conform with those by Stepmeter.

关 键 词：椭偏仪 台阶仪 纳米厚度 介质薄膜 

分 类 号：TH740.1[机械工程—光学工程]