非平衡磁控溅射系统离子束流磁镜效应模型  

The model of the magnetic mirror effect in the unbalanced magnetron sputtering ion beams

作　　者：牟宗信[1] 李国卿[1] 秦福文[1] 黄开玉[1] 车德良[1] 

机构地区：[1]大连理工大学三束材料改性国家重点实验室,大连116024

出　　处：《物理学报》2005年第3期1378-1384,共7页Acta Physica Sinica

基　　金：国家自然科学基金 (批准号 :5 0 40 70 15 )资助的课题 .~~

摘　　要：为了研究非平衡磁控溅射沉积系统的等离子体特性 ,采用常规磁控溅射靶和同轴约束磁场构成非平衡磁控溅射沉积系统 .在放电空间不同的轴向位置 ,Ar放电 ,0 2Pa和 15 0V偏压条件下 ,采用圆形平面离子收集电极 ,测量不同约束磁场条件下的饱和离子束流密度 .研究结果表明 ,在同轴磁场作用下 ,收集电极的离子束流密度能达到饱和值 9mA cm2 左右 ,有利于在沉积薄膜的过程中产生离子轰击效应 .根据磁流体理论分析了同轴约束磁场形成的磁镜效应和对放电过程的影响机理 .实验与模型计算结果的比较表明 ,模型从理论上表达了同轴磁场约束对非平衡磁控溅射等离子体特性的影响规律 .A conventional magnetron and a co-axial electro-solenoid were used to construct an unbalanced magnetron sputtering deposition system for investigating its properties. At 0.2Pa, argon gas discharging, a shielded planar ion-collecting electrode was taken to measure the saturation ion beam flux density at the different axial positions. The saturation ion flux reached about 9mA/cm(2). The magneto-hydrodynamics was applied to analyse the influences of the magnetic mirror effect on the discharge properties caused by the solenoid. As a result, the comparisons of the theoretical calculations with the experiments indicated that the model described correctly the plasma properties in the unbalanced magnetron sputtering system.

关 键 词：磁镜 非平衡磁控溅射 束流 离子束 磁场 等离子体 约束 同轴 集电极 沉积系统 

分 类 号：TB43[一般工业技术]