端部霍尔等离子体源沉积类金刚石膜的研究  

Research on Deposition Diamond-like Carbon Films with End-hall plasma Ion Source

作　　者：潘永强[1] 朱昌[1] 弥歉[1] 方勇[1] 

机构地区：[1]西安工业学院光电工程学院

出　　处：《材料科学与工程学报》2005年第2期188-190,共3页Journal of Materials Science and Engineering

摘　　要：本文通过对端部霍尔离子源特性的研究 ,采用自行研制的用于离子束辅助沉积的端部霍尔离子源成功镀制了类金刚石膜 ,并对采用该离子源制备类金刚石膜的工艺进行了研究和分析。实验结果表明 ,采用端部霍尔离子源镀制类金刚石膜不仅操作简单、可实现大面积沉积 ,而且类金刚石膜的沉积速率较大 ,最大可达 0 .8nm s,其折射率依不同工艺在 1.8～ 2 .2之间可调。并对不同工艺条件下制备的类金刚石膜的硬度进行了测试和分析。The characteristic of end-hall ion source was studied in this paper. Diamond-Like carbon (DLC) films were deposited successfully by end-hall ion source self-designed for ion beam assisted deposition . Deposition technics of DLC films were studied and analyzed. The results indicate that the operation is simple and large area of DLC films can be obtained by this method .The DLC deposition rate can reach at 0.8nm/s.The refractive index can be changed from 1.8 to 2.2 at different deposition technics. Hardness of DLC films deposited by end-hall ion source with different condition was measured and analyzed.

关 键 词：端部霍尔离子源 类金刚石膜 红外光谱 

分 类 号：TB43[一般工业技术]