限散射角电子束光刻技术及其应用前景  

Technology & Applications of Scattering with Angular Limitation in Projection Electron-Beam Lithography

作　　者：成立[1] 赵倩[1] 王振宇[1] 祝俊[1] 范木宏[1] 刘合祥[1] 

机构地区：[1]江苏大学电气信息工程学院,江苏镇江212013

出　　处：《半导体技术》2005年第6期18-22,共5页Semiconductor Technology

基　　金：江苏省高校自然科学研究基金项目(02KJB510005)

摘　　要：在下一代光刻(NGL)技术中,限散射角电子束光刻(SCALPEL)技术工艺简单、成本较低,因此是集成电路生产厂家首选的光刻方案之一。本文论述了SCALPEL的工作原理、加工工艺和方法、SCALPEL系统等,并对比分析了SCALPEL在NGL研发中的技术优势及其应用要点。In the next generation of lithography(NGL), scattering with angular limitation in projection electron-beam lithography(SCALPEL) is one of the first-selected schemes for ICs, for its technique is simple and the cost is relatively low. The operating principle, processing technique and method of SCALPEL as well as its system are discussed, its technical superiority in NGL and the main points of application are contrastively analyzed.

关 键 词：超大规模集成电路 纳米CMOS器件 电子束光刻 散射 技术优势 应用前景 

分 类 号：TN305.7[电子电信—物理电子学] TN47