一种TiAlN多层膜制备新方法  

A new method for preparation of TiAlN multilayer films

作　　者：李根[1] 张高会[1] 徐鹏[1] 乔宪武[1] 于明州[1] 施远驰[1] 司平占[1] 

机构地区：[1]中国计量学院理学院,浙江杭州310018

出　　处：《中国计量学院学报》2012年第2期193-197,共5页Journal of China Jiliang University

摘　　要：采用自行设计制造的离子束联合溅射系统,将磁控溅射与离子注入技术相结合,在镁合金表面形成多层TiAlN强化膜.用金相显微镜、X射线衍射仪、原子力显微镜、摩擦磨损仪等手段,研究了多层膜的表面形貌、结构和性能.结果表明,TiAlN膜膜表面光滑致密、孔隙率大大降低,粗糙度为42.28nm,由TiAlN强化相组成;成膜后耐磨性有所提高,但摩擦系数变化不大,未达到减摩作用.The TiAlN multilayer films were coated on the surface of magnesium alloy by using a novel multi-periodic composite processing technology.The surface morphology,the microstructure and the property of TiAlN multilayer films were analyzed by using an optical microscope,an X-ray diffraction,an atomic force microscope and a friction-abrasion testing machine.The results show that the TiAlN multilayer film formed on magnesium alloy possesses a smooth and compact surface as well as reduced surface porosity with the surface roughness of 42.28 nm,and is composed of TiAlN strengthening phase.The wear resistance of the multilayer film is improved;but its friction coeffient is similar to that of untreated magnesium alloy.

关 键 词：镁合金 磁控溅射 离子注入 

分 类 号：TB3[一般工业技术—材料科学与工程]