中频孪生靶非平衡磁控溅射制备Ti/TiN/Ti(N,C)黑色硬质膜  

BLACK HARD FILMS Ti/TiN/Ti(N,C) DEPOSITED BY MF UNBALANCED TWIN TARGET MANETRON SPUTTERING

作　　者：马胜歌 吴宇峰[2] 耿漫[1] 

机构地区：[1]深圳国家863计划材料表面工程技术研究开发中心,广东深圳518029 [2]东北大学,辽宁沈阳110004

出　　处：《真空与低温》2006年第1期15-18,22,共5页Vacuum and Cryogenics

基　　金：国家863计划资金项目(2001AA338010)资助

摘　　要：利用自制的等离子体增强型渗注镀复合处理设备上的非平衡磁控溅射功能,在不同硬度基底上制备了Ti/TiN/Ti(N,C)多层复合膜。膜呈深黑色,表面光滑平整,可见光区反射率在8.2%～10.2%之间,亮度L=38.01,沉积速率约为1.21μmh。膜的硬度测试结果受基底影响较大,YW2硬质合金基底上制备0.85μm厚的黑色硬质膜显微硬度Hv(25g)=2936。膜的结合力不高,有待进一步优化工艺加以解决。Black hard Ti/TiN/Ti（N,C） films are deposited on different substrates by MF unbalanced twin target magnetron sputtering machine. Reflecfivity of the rdm in the visible spectrum is beween 8.2%-10.2% . Luminance of the film is 38.01. Deposition rate of the film is about 1.21μm/h. The sarface is smooth. The hardness of substrates greatly effect the test results of the film＇s hardness. The influence will be reduced with increase hardness of substrate. The adhesion between the film and the substrate is not strength.

关 键 词：黑色硬质膜 非平衡磁控溅射 Ti(N C) 中频反应溅射 孪生靶 

分 类 号：TB43[一般工业技术]