集成电路光刻模拟的数据后处理研究  

Study of Data-based IC Lithographic Simulation

作　　者：贾志城[1] 陈乖丽[2] 

机构地区：[1]甘肃政法学院图书馆,甘肃兰州730070 [2]航空航天工业部135厂,甘肃兰州730070

出　　处：《甘肃联合大学学报（自然科学版）》2006年第3期39-42,共4页Journal of Gansu Lianhe University :Natural Sciences

摘　　要：在集成电路光刻过程中,利用光刻模拟软件将光刻模拟结果与设计模板进行比较可以预先发现模板设计中的缺陷.由于光刻模拟软件与模板设计软件数据格式的不同影响了这一步工作的顺利完成.本文通过对两种软件数据格式的研究,利用Perl语言实现了两种软件之间数据格式的转换,具有一定的实用价值.In the process of IC Lithographic Simulation, software of Lithographic Simulation is used to compare the result of Lithographic Simulation and the design model so as to foresee the shortcoming existing in the model design. The difference of the data format between the software of Lithographic Simulation and the software of model design affects this job being carried out successfully. Through the data format study of the two kinds of software and by using Perl language to have conducted the data format transmission between the two kinds of software, the paper has certain practical value.

关 键 词：光学邻近校正 光刻模拟 数据处理 

分 类 号：TP431.2[自动化与计算机技术]