铜上采用过渡层沉积类金刚石薄膜的研究  

Diamond-like carbon (DLC) films deposited on copper substrate through preparation of intermediate layers

作　　者：王静[1] 刘贵昌[1] 汲大鹏[1] 徐军[2] 邓新禄[2] 

机构地区：[1]大连理工大学化工学院,大连116012 [2]大连理工大学三束改性国家重点实验室,大连116012

出　　处：《物理学报》2006年第7期3748-3755,共8页Acta Physica Sinica

摘　　要：将等离子增强非平衡磁控溅射物理气相沉积(PEUMS-PVD)和电子回旋共振-微波等离子体增强化学气相沉积(MW-ECRPECVD)技术相结合,通过制备不同的过渡层,在铜基上成功地制备了类金刚石膜.拉曼光谱分析表明,所制备的碳膜具有典型的类金刚石结构特征.检测结果表明,随着沉积偏压的增大,D峰和G峰均向高波数漂移,ID/IG值增大,表面粗糙度减小,而平均硬度和弹性模量呈先增大后减小的趋势.Diamond-like carbon （DLC） films were prepared on copper substrate through preparation of intermediate layers by combined plasma enhanced sputtering physical vapor deposition and microwave electron cyclotron resonance plasma enhanced chemical vapor deposition techniques. Raman spectroscopy indicated that the films had amorphous structure and typical characteristic of DLC film. With the increase of deposition bias voltage, D and G band both shifted to high wave-number and ID/lG increased gradually. The morphology was characterized by atomic force microscopy （AFM） and the results indicated that the films were dense and homogeneous , and the roughness of the films decreased with the increase of the deposition bias voltage. Hardness and modulus of DLC were measured by the nanoindentation.

关 键 词：铜基体 类金刚石膜 过渡层 拉曼光谱 

分 类 号：O484.4[理学—固体物理]