X射线Kirkpatrick-Baez显微镜用超反射镜的研制  

Development of X-ray supermirrors used in Kirkpatrick-Baez microscope

作　　者：顾春时[1] 王占山[1] 王风丽[1] 张众[1] 穆宝忠[1] 秦树基[1] 陈玲燕[1] 

机构地区：[1]同济大学精密光学工程技术研究所物理系,上海200092

出　　处：《强激光与粒子束》2006年第7期1095-1098,共4页High Power Laser and Particle Beams

基　　金：国家863计划项目资助课题;上海市博士后研究基金资助课题(05R214140);同济大学理科发展基金;教育部新世纪优秀人才支持计划资助课题(NCET-04-0376)

摘　　要：介绍了一种可应用于X射线Kirkpatrick-Baez(KB)显微镜的光学元件X射线超反射镜。选用的W和B4C作为镀膜材料,膜对数为20,采用单纯型调优的方法实现了X射线超反射镜设计,用磁控溅射的方法在Si基片上完成了W/B4C X射线超反射镜的制备。采用高分辨率X射线衍射仪(8 keV)测量了X射线超反射镜的反射特性。制备的X射线超反射镜在掠入射角分别为1.052°和1.143°处,反射角度带宽为0.3°,反射率达到20%,可满足KB型显微镜的要求。Design and fabrication of the X-ray supermirror used as reflective optical element in Kirkpatrick-Baez （KB） microscope were proposed. W/B4C was selected as coating materials pair. Design method and optimization of X-ray supermirrors were discussed. The designed multilayer structure was deposited on the Si wafer substrate using magnetron-sputtering system. The reflectivities of W/B4 C supermirrors were measured by X-ray diffraction instrument （8 keV）. The reflectivities of supermirrors are 20 % at 1. 052° and 1. 143° designed grazing incident angles. The bandwidth of reflective plateau reaches 0.3°, which can fulfill the requirements of KB microscope.

关 键 词：多层膜 X射线超反射镜 KB型显微镜 磁控溅射 反射 

分 类 号：O434[机械工程—光学工程] O484.41[理学—光学]