钢基底上预镀中间层沉积金刚石膜  

Deposition of diamond films on steel substrate by precoating an intermediate layer

作　　者：陈志清[1] 高志栋[1] 曾效舒[1] 梁吉[1] 魏秉庆[1] 吴德海[1] 

机构地区：[1]清华大学机械工程系

出　　处：《清华大学学报（自然科学版）》1996年第8期83-86,共4页Journal of Tsinghua University(Science and Technology)

摘　　要：利用表面预镀中间层在４５号钢上化学气相沉积（ＣＶＤ）得到了金刚石膜。钢基底表面金刚石涂层具有许多潜在应用价值，但直接在钢上沉积生长金刚石面临长的形核期，铁原子的触媒作用和热膨胀不匹配等严重问题。文中采用钢基底表面预镀中间层的方法，阻止碳向基底中扩散，增强膜基结合和抑制ＳＰ２杂化碳的沉积。分别研究了直接在钢基底上、表面预镀铜膜和表面预镀硅膜钢基底上热丝法沉积金刚石膜的工艺特点。通过ＳＥＭ、Ｒａｍａｎ谱和划痕法检验表明，钢基底表面预镀硅膜作为中间层，是一种在钢上沉积金刚石膜的有效方法。Diamond films have been deposited on carbon steel with an intermediate layer by chemical vapor deposition (CVD). Diamond coatings on steel substrates are interesting for potential applications, but there are at least three serious problems: a long nucleation period, the catalytic effect of iron, and thermal expansion mismatch. An intermediate layer was used to block carbon diffusion, enhance adhesion and suppress SP2 carbon precipitation.We report the research on the deposition of diamond films on steel substrate without a buffer layer, and copper coated/silicon coated steel substrates, respectively. By scanning electron microscopy (SEM), Raman spectroscopy and scratch test, it is shown that precoating a silicon intermediate layer is an efficient method for deposition of diamond films on steel substrates.

关 键 词：金刚石膜 化学气相沉积 钢 表面结构 

分 类 号：TG174.45[金属学及工艺—金属表面处理]