ZnO薄膜制备及其有机蒸汽敏感特性分析  

Preparation of ZnO by DC Reactive Magnetron Sputtering and Analysis of Its Gas-sensitive Property

作　　者：潘国峰[1] 何平[2] 孙以材[1] 程东升[1] 

机构地区：[1]河北工业大学信息工程学院,天津300130 [2]河北工业大学计算机科学与软件学院,天津300130

出　　处：《河北工业大学学报》2006年第5期23-27,共5页Journal of Hebei University of Technology

摘　　要：采用直流磁控溅射法进行ZnO薄膜的制备,探讨了O2/Ar对薄膜方块电阻,退火对薄膜结构的影响.在对不同退火温度的ZnO薄膜的气敏特性进行测试后表明:较低的退火温度有利于提高器件气敏特性,其中经600℃退火的ZnO薄膜的灵敏度最高,其最佳工作温度为350℃.实验制备的ZnO薄膜对丙酮、汽油等有机蒸汽都有较高的敏感性和较短的响应-恢复时间,呈现对有机蒸汽敏感的广谱性.ZnO thin films were prepared by DC magnetron sputtering deposition on alumina tubes and silicon substrates. After the deposition, films were annealed in muffle respectively at 600℃, 900℃ and 1200℃. The film structure, grain size and gas sensing property varies with the annealing condition and O2/Ar are changed. X-ray diffraction （XRD） and gas sensing measurements were carried out to find out the relation between sensitivity and annealing temperature, Sensitivity is highest within samples after 600℃ annealing. The best operating temperature is 350℃, The thin film has wonderful sensitivity and response （recover time） time towards acetone, ethanol and Gasoline etc.

关 键 词：反应溅射 ZNO薄膜 退火温度 有机蒸汽敏感特性 选择性 

分 类 号：TP212.2[自动化与计算机技术—检测技术与自动化装置]