等离子体增强化学气相沉积制备的ZnO薄膜研究  

Research of ZnO Thin Films Grown by Plasma-enhanced Chemical Vapor Deposition

作　　者：郭爱波[1] 刘玉萍[1] 陈枫[1] 李斌[1] 但敏[1] 刘明海[1] 胡希伟[1] 

机构地区：[1]华中科技大学电气与电子工程学院,湖北武汉430074

出　　处：《表面技术》2006年第6期5-7,共3页Surface Technology

摘　　要：鉴于ZnO薄膜材料的多功能性,用等离子体增强化学气相沉积方法在金属Cu和普通玻璃上生长了ZnO薄膜。扫描电子显微镜获得其表面形貌;能谱分析获得其元素种类及相对含量,在能谱图上明显地观察到了Zn峰和O峰的存在,且Cu基上Zn和O原子比接近1∶1;X射线光电子能谱分析得出样品中的Zn和O全部以化合态存在而不存在Zn原子和O原子。但Cu基上的ZnO薄膜易吸收空气中的氧和水蒸汽,薄膜质量期望通过生长合适过渡层得到改善。The ZnO thin films are fabricated on copper and glass substrates with plasma-enhanced chemical vapor deposition because of its muhifunction. SEM is used to obtain the surface morphology of ZnO, EDAX is used to analyze the element types and the relative contents of atoms, the peaks of Zn and O are observed obviously by the EDAX results, and the ratio of the Zn and O atoms is approximately 1 ： 1 ; XPS results show that the zinc and oxygen of the samples exist as compounds instead of the single atom of zinc and oxygen ; So the zinc oxygen is fabricated successfully on copper and glass substrates. But the ZnO thin films on Copper are apt to absorb the oxygen and vapor through atmosphere, the quality of ZnO thin films will be improved by fabricating a suitable buffer layer.

关 键 词：等离子体增强 化学气相沉积 SEM EDAX XPS 衬底 

分 类 号：TQ174.7[化学工程—陶瓷工业]