用于光刻机模拟运动的精密工件台宏动定位系统研制  

Design and Manufacture on Precision Positioning System of Wafer Stage for a Simulated Macro-motion System of Lithography

作　　者：邓习树[1] 吴运新[1] 杨辅强[1] 王永华[1] 

机构地区：[1]中南大学机电工程学院,湖南长沙410083

出　　处：《电子工业专用设备》2007年第2期39-43,62,共6页Equipment for Electronic Products Manufacturing

基　　金：国家自然科学基金委项目重大项目课题(编号:50390064);上海市科委联合资助项目"精密机械减振隔振技术研究"。

摘　　要：为给步进扫描光刻机的设计研究提供理论指导,解决光刻机工件台宏动定位平台的设计和控制问题,根据工业应用中步进扫描光刻机的运动特点和工作要求,设计了一种H型精密工件台宏动定位系统和同步控制方案。试验结果表明,其各项性能指标均满足设计要求,对指导实际工业应用具有一定的参考价值。In order to provide academic steering for the design of Stepping and Scanning Lithography and settle the controlling and designing problems of the Macro-motion table for Lithography wafer Stage, the paper designs an H shape precision macro-positioning system and a synchronous controlling scheme for the wafer stage based on its motion features and working requirements of the stepping and scanning lithography in industry. Testing results indicate that the designed system can meet our design targets and possesses referenced values for industrial application.

关 键 词：光刻机 工件台 定位 研制 

分 类 号：TH161.6[机械工程—机械制造及自动化]