用不同的Mo靶溅射功率制备Mo/Si多层膜  

Mo/Si multilayers prepared with different sputtering power of Mo target

作　　者：秦俊岭[1] 邵建达[1] 易葵[1] 

机构地区：[1]中国科学院上海光学精密机械研究所

出　　处：《强激光与粒子束》2007年第1期67-70,共4页High Power Laser and Particle Beams

基　　金：国家863计划项目资助课题

摘　　要：用磁控溅射法制备了周期厚度和周期数均相同的Mo/Si多层膜,用原子力显微镜和小角X射线衍射分别研究了Mo靶溅射功率不相同时,Mo/Si多层膜表面形貌和晶相的变化。随后在国家同步辐射实验室测量了Mo/Si多层膜的软X射线反射率。研究发现,随着Mo靶溅射功率的增大,Mo/Si多层膜的表面粗糙度增加,Mo的特征X射线衍射峰也增强,Mo/Si多层膜的软X射线峰值反射率先增大后减小。Mo/Si muhilayers were prepared by magnetron sputtering. With different sputtering power of Mo target, surface morphology and crystal phases of Mo/Si muhilayers were studied by AFM and XRD. Soft X-ray reflectivity of Mo/Si multilayers were measured. As sputtering power of Mo target was increasing, surface roughness of Mo/Si film was increasing, characteristic diffraction peak of Mo species became stronger and stronger, furthermore, soft X-ray peak reflectivity of Mo/Si multilayers first increased and then reduced.

关 键 词：Mo靶 MO/SI多层膜 溅射功率 软X射线 反射率 

分 类 号：O484.5[理学—固体物理]