磁控溅射中电磁场分布及带电粒子运动的模拟与计算  

Simulation and calculation of electromagnetic field distribution and movement of charged particles during magnetron sputtering

作　　者：王君[1] 刘珍[1] 陈长琦[1] 朱武[1] 陈明[1] 

机构地区：[1]合肥工业大学机械与汽车工程学院,安徽合肥230009

出　　处：《真空》2007年第4期20-23,共4页Vacuum

基　　金：安徽省教育厅自然科学基金资助(2002KJ241ZD)

摘　　要：电磁场分布及其对各种带电粒子的约束情况对磁控溅射过程有着决定性的影响。本文首先利用物理场耦合分析软件Comsol3.2a分析了直流磁控溅射电磁场的分布,并且计算分析了单个带电粒子的运动情况。在此基础上,计算分析了带电粒子束流在电磁场中的运动情况、空间分布,得到了磁控溅射电磁场区域分布、单个电子的运动轨迹及带电粒子在空间区域中位置分布。The electromagnetic field distribution and its influence on charged particles have significant effect on magnetron sputtering process. Based on the static el.ectromagnetic field distribution computed from the software COMSOL Multiphysics 3.2a, the movement of single particle is analyzed. Then, the movement and spatial distribution of charged particle streams are computed. By simulation and calculation, the electromagnetic field distribution, movement trace of single electron and charged particle distribution in space are obtained.

关 键 词：电磁场分布 磁控溅射 模拟 计算 粒子运动 

分 类 号：TB71[一般工业技术—真空技术]