全方位离子注入沉积复合镀膜计算机测控系统  

Computer Control System of Vacuum Coating on the Hubrid Plasma Immersion Ion Implantation & Deposition(PIII&D) Equipment and Technology

作　　者：于心俊[1] 陈星[1] 

机构地区：[1]河南工业大学,河南郑州450007

出　　处：《信息工程大学学报》2007年第3期378-380,共3页Journal of Information Engineering University

摘　　要：文章提出的薄膜复合制备方法与装置的测控系统能充分利用磁控溅射、真空阴极弧光蒸发、离子注入等方法,为全方位注入沉积复合镀膜表面改性提供所需等离子体,使之可以根据不同的工艺要求设计膜体的成分结构,从而很容易获得不同的改性膜层,来提高膜体的硬度、抗氧化性及热稳定性等。The thesis studies the control system of the thin film compound making method and device, it can fully take use of the method of magnetic control sputtering, vacuum cathodic arc ion plating,ion infusion etc. It provides plasma for the material surface of the PⅢ＆D to change the performances of surface. It can make the structure of composition and changed surface film according to the craft. The hardness, anti-oxidize and hot stability are improved.

关 键 词：磁控溅射 真空镀膜 实时监控 模糊控制 

分 类 号：O53[理学—等离子体物理]