磁控反应溅射氧流量变化对TiO_2薄膜影响的实验研究  

EXPERIMENT RESEARCH OF OXYGEN FLUX EFFECT ON TITANIUM DIOXIDE FILMS BY REACTIVE MAGBETRON SPUTTERING

作　　者：常学森[1] 巴德纯[1] 闻立时[2] 刘坤[1] 

机构地区：[1]东北大学真空与流体工程研究中心,辽宁沈阳110004 [2]中国科学院金属研究所,辽宁沈阳110015

出　　处：《真空与低温》2007年第3期163-167,共5页Vacuum and Cryogenics

摘　　要：通过中频交流磁控溅射设备,利用金属Ti靶制备出了有一定厚度的、质量较好的TiO2薄膜,TiO2薄膜被沉积在玻璃基底上。利用各种分析测试手段对其性能进行了测试,初步探讨了不同氧流量对TiO2薄膜的影响。实验表明,不同氧流量下制备的TiO2薄膜的亲水特性发生了变化。The Titanium Dioxide thin Films with good quality and the definite thickness at the conditions of different oxygen flux is prepared by Mid-Frequency Reactive Magnetron Sputtering. The thin films were prepare on glass substrate. Some testing method to test its performance and the different factors effect on Titanium Dioxide thin Film effect preliminarily at the conditions of different oxygen flux are discussed. The experiment show that the performance of effect of doping Titanium Dioxide thin Film would have been changed a lot at the conditions of different oxygen flux.

关 键 词：纳米二氧化钛 薄膜 光电效应 亲水性 磁控溅射 

分 类 号：O484.4[理学—固体物理]