“场发花”现象研究  

The Research of "Defocus" Phenomena

作　　者：寇春梅[1] 顾霞[1] 

机构地区：[1]中国电子科技集团公司第58研究所,江苏无锡214035

出　　处：《电子与封装》2007年第12期38-41,共4页Electronics & Packaging

摘　　要：随着半导体技术的不断发展,特征尺寸也不断缩小,光刻对条宽的控制能力在整个半导体技术中显得十分重要,而场发花现象对光刻来说是个较为严重的质量问题,它严重影响了光刻对条宽的控制能力,同时还造成硅片的大量返工,使生产成本增加、产量降低,也使生产的圆片质量可靠性受到置疑。文章对造成场发花现象的原因,场发花造成的影响以及如何避免场发花现象做了一定的解释。With the development of the semiconductor technology, the character size becomes more reducer. The control ability become especially important. The phenomenon of defocus leads lithographic problems, it reduce the ability of the CD control and result in high reworks, increase rework cost and decrease the manufacture. The reliability of the product also will be oppugned. This paper focuses on the causes and the effects of the phenomenon of defocus, and how to avoid the phenomenon of defocus to be explained.

关 键 词：场发花 工艺窗口 化学机械抛光 

分 类 号：TN306[电子电信—物理电子学]