气相沉积技术在制备高折射率光子晶体中的应用  

The Application of Vapor Deposition Technique in Creating High Refractive Index Photonic Crystals

作　　者：李海博[1] 李召红[1] 赵秋玲[1] 王霞[1] 

机构地区：[1]青岛科技大学数理学院光电子技术研究所,青岛266042

出　　处：《化学通报》2008年第2期97-101,共5页Chemistry

基　　金：国家自然科学基金项目(60608015);山东省教育厅科技计划项目(J06P03);山东省科技厅中青年科学家科研奖励基金(2006BS04033);校人才科研基金项目(0022208)资助

摘　　要：采用激光全息光刻技术或激光直写技术制作微结构具有便捷、灵活、高效等优势,目前已成为研究制备光子晶体的一种有效方法。用全息光刻技术所制备的微结构的特点是单晶面积大(即内部结构缺陷较少)和可根据需要制作研究多种周期或准周期的晶格结构。但是所制备的结构由于感光树脂与空气的折射率比值较低,不能得到完全带隙光子晶体,从而使其应用受到局限性。以此树脂结构为模板,通过各种方法对其进行二次加工,制作高介电常数材料的反结构,近期已成为研究热点。本文介绍了气相沉积技术在制备高折射率光子晶体方面的应用和研究进展。Recently, holographic lithography or direct laser writing technology has been widely used to fabricate microstructures. By the favorite of their convenient and flexible, they are becoming an available method to obtain large scale photouic crystals. It can offer a wide range of period, quasi-period and even spiral lattices. However, the refractive index contrast of the fabricated polymeric structure is insufficient to open a complete photonic band gap. This limitation may be overcome by using the original microstructure as a template for infiltration to create inverse replica with higher refractive index materials. In this paper, the application and development of the research for Vapor-Deposition technique on infiltrating polymeric resists photonic crystal to create high-index contrast photonic crystal are introduced.

关 键 词：原子层沉积 化学气相沉积 激光全息光刻 激光直写技术 

分 类 号：O786[理学—晶体学]