表面修饰改善溶液法金属诱导晶化薄膜稳定性与均匀性研究  

Investigation on the improvement of the stability and uniformity of solution-based metal-induced crystallization poly-Si using surface-embellishment

作　　者：李鹤[1,2,3] 李学东[1,2,3] 李娟[1,2,3] 吴春亚[1,2,3] 孟志国[1,2,3] 熊绍珍[1,2] 张丽珠[4,3] 

机构地区：[1]南开大学光电子薄膜器件与技术研究所,天津300071 [2]南开大学光电子薄膜器件与技术天津市重点实验室,天津300071 [3]南开大学光电信息技术科学教育部重点实验室,天津300071 [4]天津工程师范学院数理系,天津300222

出　　处：《物理学报》2008年第4期2476-2480,共5页Acta Physica Sinica

基　　金：国家高技术研究发展计划(批准号:2004AA303570);国家自然科学基金重点项目(批准号:60437030);天津市自然科学基金(批准号:05YFJMJC01400)资助的课题~~

摘　　要：提出了一种表面修饰的金属诱导晶化方法,以稳定地获得晶粒尺寸均匀的多晶硅薄膜.为在非晶硅表面获得均匀稳定的Ni源,在晶化前驱物表面浸沾Ni盐溶液之前,先旋涂一层表面亲合剂.通过控制Ni盐溶液的浓度,可以获得均匀性较好、晶粒尺寸分布在20—70μm的多晶硅薄膜.该方法的特点是改善了Ni盐溶液在表面的黏附状态,从而可在比常规Ni盐溶液浓度低1—2个数量级的情况下仍能获得大晶粒的多晶薄膜.To obtain poly-Si with good uniformity and stability, a new method of solution-based metal-induced crystallization （S-MIC） with surface-embellishment was proposed in this paper. A special solution that can embellish the surface of a-Si was employed to improve the conglutination between nickel and a-Si thin film. Before the nickel solution was spin coated, the special solution was spin coated on the a-Si sample at first. By controlling the nickel salt concentration, the poly-Si with grain size of 20-70 μm and good uniformity could be achieved. Furthermore, the nickel salt concentration is lower than that used in the traditional method of S-MIC by 1 or 2 orders of magnitude.

关 键 词：表面修饰 溶液法金属诱导晶化 多晶硅 均匀性 

分 类 号：O484[理学—固体物理]