IC制造中的ARMA模型分析与动态工艺控制  

ARMA Modeling and Dynamic Process Control in IC Manufacturing

作　　者：黄伟[1] 窦维治[1] 刘道广[1] 严利人[1] 

机构地区：[1]清华大学微电子学研究所,北京100084

出　　处：《微电子学》2008年第2期187-191,共5页Microelectronics

摘　　要：提出了动态工艺条件控制的概念,即通过引入自适应算法ARMA,可对集成电路制造工艺效果进行预测,并根据预测结果,对工艺条件加以实时的调整控制,达到改善成品率的目的。采用动态工艺条件控制,打破了几十年来IC制造的固定模式,是IC制造领域具有重大创新性的提法。The concept of dynamic process control was proposed, in which ARMA, one of self-adapting time series arithmetics, was used to analyze and forecast the result of an undergoing process step. Depending on the forecasted data, process parameters can be changed accordingly to improve the process batch-to-batch uniformity without any further cost on IC machines. The result also demonstrated that this ＂soft＂ method was one of the advanced process control ways.

关 键 词：半导体工艺 成品率 动态工艺控制 ARMA模型 时间序列预测 

分 类 号：TN305[电子电信—物理电子学]