反应磁控溅射法制备Y_2O_3金刚石红外减反膜  

Reactive magnetron sputtering of IR anti-reflection Y_2O_3 coatings for freestanding CVD diamond window applications

作　　者：郭会斌[1] 魏俊俊[1] 王耀华[1] 贺琦[1] 吕反修[1] 唐伟忠[1] 

机构地区：[1]北京科技大学材料科学与工程学院,北京100083

出　　处：《金刚石与磨料磨具工程》2008年第3期10-14,18,共6页Diamond & Abrasives Engineering

基　　金：国家自然科学基金(项目编号:50572007);教育部博士点基金(项目编号:20040008018)资助项目

摘　　要：采用纯钇（Y）金属靶,在氧＋氩反应气氛中进行了Y2O3薄膜直流反应磁控溅射沉积。研究了工艺参数改变对薄膜的影响,选择较优的工艺在金刚石表面沉积符合光学厚度的薄膜,达到增透减反射效果。利用X射线光电子能谱（XPS）和扫描电子显微镜（SEM）研究了薄膜的组成和结构。利用X射线衍射仪（GIXRD）和椭偏仪（Ellipsometer）研究了不同衬底温度和热处理温度对氧化钇薄膜组织结构和光学性能的影响。采用傅立叶红外光谱仪（FTIR）检测了镀膜前后金刚石红外透过性能。研究发现Y2O3薄膜能够有效提高金刚石在8-12μm的红外透过性能,在8μm处最大增透可达21.8%,使金刚石红外透过率由66.4%提高到88.2%;在3-5μm范围,双面镀制了Y2O3薄膜的金刚石平均透过率达64.9%,比没有镀膜的金刚石在该处的平均透过率54%高出10.9%。Yttrium dioxide （Y203） thin films were prepared by direct current reactive magnetron sputtering of high purity Y target in Ar/O2 mixtures. The composition and morphology of Y2O3 film deposition was studied by X- ray photo election spectroscopy （XPS） and scanning electron microscopy （SEM）. The optical performance and the structure of the as -deposition Y2 03 thin films at different deposition temperatures and the films after heat treatment were characterized by Ellipsometry and X -ray diffraction （XRD）. The IR transmittance of the freestanding diamond film sample is increased to 88.2% at the most after depositing Y2O3 films in the 8 - 12 μm long IR wavelength range ; whilst the average IR transmittance of the diamond film sample rise from 54% to 64.9% in the 3 -5 μm micrometer mid -IR wavelength range.

关 键 词：Y2O3薄膜 反应磁控溅射法 红外透过率 减反射 

分 类 号：TQ164[化学工程—高温制品工业]